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Model 350 Four-Source Organic-Inorganic Thermal Evaporation Coating System

This device features a Φ350mm stainless steel vacuum chamber and is equipped with four independent temperature-controlled boat or crucible evaporation sources, suitable for organic small molecules and inorganic materials. It is equipped with a multi-channel thickness gauge for real-time monitoring of evaporation rate and thickness, and the sample stage supports rotation and heating. The system is user-friendly, with excellent vacuum performance, meeting the high-precision preparation requirements for multilayer functional films.

Details

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Overview of Equipment and Application Fields

The 350-type four-source organic-inorganic thermal evaporation coating system is a multifunctional vacuum coating device specially developed for the research and development of new optoelectronic materials. It is highly suitable for the preparation of organic light-emitting diodes (OLEDs), organic photovoltaic devices (OPVs), perovskite solar cells, quantum dot optoelectronic devices and other related processes.

The equipment is equipped with four independently controlled evaporation sources, which can realize continuous deposition of various organic small molecule materials, metal electrode materials and inorganic dielectric materials in a single vacuum environment. It effectively avoids material oxidation and optimizes the interfacial quality of thin films. This equipment is widely applied in universities, scientific research institutions and enterprise R&D departments for new material research and small-batch laboratory device preparation.

Core Functional Highlights

  • Equipped with four independent high-precision temperature control systems and four separate evaporation sources. Each evaporation source is fitted with a high-accuracy PID controller, featuring a wide temperature adjustment range and excellent temperature stability. Users can set parameters according to the sublimation and evaporation characteristics of different materials, including low-temperature sublimation for organic materials and high-temperature evaporation for metal materials. Multi-material sequential deposition can be realized to prepare complex multilayer thin film structures.

  • Organic and inorganic dual-purpose modular design. Evaporation sources support flexible switching between boat-type evaporators for metals and inorganic materials, and crucible-type evaporators for organic small molecule powders. The optimized shielding structure of the evaporation port effectively reduces thermal radiation to the cavity and surrounding materials, and prevents organic material decomposition and cross contamination.

  • High-precision multi-channel thin film thickness monitoring system. The built-in high-performance multi-channel quartz crystal thickness monitor can synchronously detect the deposition rate and cumulative thickness of multiple evaporation sources. With automatic shutter control, the equipment can automatically close the baffle after reaching the set thickness, realizing high-precision thickness control, and ensuring good consistency and repeatability of each functional thin film layer.

  • Optimized vacuum environment and sample platform

    1. High vacuum design: Combined with mechanical pump and molecular pump units, the ultimate vacuum can reach 5×10⁻⁵ Pa, providing a low-oxygen and low-moisture environment for high-quality organic thin film preparation.

    2. Multifunctional sample stage: The sample platform supports adjustable rotary motion from 0 to 20 rpm to improve film thickness uniformity. Optional platform heating function is available, with a temperature range of 150°C to 300°C, meeting the process demands of substrate annealing and high-temperature deposition.

  • Intelligent safety and linkage control system. It is provided with complete safety interlock protection functions, including cooling water flow protection, overcurrent protection and over-temperature alarm. The touch screen operation interface can real-time display evaporation source temperature, vacuum degree, film thickness and operating status. It supports process recipe storage and calling to simplify daily operation.

Technical Parameters and Specifications

Parameter Item

Specification

Vacuum Chamber

Size: Φ350 mm × 350 mm, stainless steel structure Opening mode: side opening / top opening optional, with high sealing performance

Vacuum Performance

Ultimate vacuum: ≤ 5×10⁻⁵ Pa Working vacuum range: 1×10⁻³ Pa ~ 5×10⁻² Pa Cavity pressure rise rate: ≤ 0.5 Pa/h

Evaporation Source System

Quantity: 4 independent evaporation sources Structure: boat type / crucible type optional Temperature control: 4 sets of independent PID control, temperature control accuracy ±1℃ Power: single-source power adjustable, conventional range 0–500W or customized

Film Thickness Monitoring

Testing unit: multi-channel quartz crystal thickness monitor Detection resolution: 0.1 Å Functions: real-time rate monitoring, cumulative thickness calculation, automatic shutter control

Sample Stage System

Applicable substrate size: 2–4 inches Rotation speed: 0–20 rpm adjustable Optional heating temperature: room temperature ~ 300℃, temperature accuracy ±1℃

Vacuum Unit

Fore-stage pump: rotary vane mechanical pump High vacuum pump: turbo molecular pump, pumping speed ≥400 L/s

Air Circuit System

1–2 groups of fine adjustment inflation valves, used for nitrogen filling and process gas intake

Cooling System

Circulating water cooling system, used for cooling evaporation sources, molecular pumps and vacuum chamber

Control System

PLC + touch screen integrated control, supporting recipe storage and fault self-checking

Power Supply

AC 220V/380V, 50Hz, total power ≤ 3kW (adjustable with heating configuration)

Typical Application Scenarios

  • OLED device research: preparation of multilayer functional structures such as hole injection layer, light-emitting layer, electron transport layer and metal electrode layer.

  • Perovskite solar cell research: deposition of charge transport materials such as Spiro-OMeTAD and C60, as well as top metal electrode layers.

  • Organic field effect transistor (OFET) preparation: accurate control of the thickness and interface state of semiconductor layers and dielectric layers.

  • Optical thin film preparation: deposition of organic and inorganic composite multilayer anti-reflection films, reflective films and functional optical coatings.

  • Teaching and experimental research: demonstration of thermal evaporation principle and multilayer film preparation technology, applicable to university laboratory teaching and scientific training.

Why choose the 350-type four-source system?

The 350-type four-source organic-inorganic thermal evaporation coating system is professional customized equipment for optoelectronic material research. With four-channel independent temperature control and universal evaporation design for organic and inorganic materials, it effectively solves the preparation bottleneck of multilayer films in traditional single-source evaporation equipment.

Equipped with high-precision thickness monitoring and stable high vacuum environment, it ensures stable experimental data and consistent device performance. The overall structure is compact, and the human-computer operation interface is simple and intuitive. It is the preferred experimental coating equipment for scientific research laboratories with limited space and high experimental requirements.